Based on the long-term cooperative relationships with globally renowned enterprises, the company has accumulated expertise in synthetic purification, metal ion analysis and removal capabilities, pilot-scale production advantages, and enjoys a strong reputation in the Japanese market. Since 2015, the company has been involved in the research and development of photoresist monomers and film materials, which are intermediate materials used in semiconductor lithography, with a focus on high-end photoresist materials. The company's main product portfolio includes semiconductor photoresist monomers, TFT flat layer photoresists, film material intermediates, and polyimide monomers. The film material intermediates are primarily used for the production of optical film materials used in display panels. The photoresist materials include photoresists for displays and semiconductor photoresist monomers. The semiconductor photoresist monomers primarily consist of ArF photoresist monomers, KrF photoresist monomers, and EUV photoresist monomers. The photoresist used for displays primarily refers to TFT flat layer photoresist. The photoresist market has high entry barriers, with long customer validation cycles. However, the company has successfully developed multiple types of photoresist materials and has experienced rapid business growth. Its products are widely exported to renowned enterprises in countries such as South Korea and Japan.